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A study of unsteady heat and mass transfer in the modified chemical vapor deposition process
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 Title & Authors
A study of unsteady heat and mass transfer in the modified chemical vapor deposition process
Park, Gyeong-Sun; Choe, Man-Su;
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 Abstract
An analysis of unsteady heat and mass transfer in the Modified Chemical Vapor Deposition has been carried out including the effects of chemical reaction and variable properties. It was found that commonly used quasi-steady state assumption could be used to predict overall efficiency of deposition, however, the assumption would not provide detailed deposition profile. The present unsteady calculations of wall temperature profile and deposition profile have been compared with the existing experimental data and were in good agreement. The effects of variable torch speed were studied. Linearly varying torch speed case until time=120s resulted in much shorter tapered entry than the constant torch speed case.
 Keywords
Heat and Mass Transfer;MCVD;Particle Deposition;
 Language
Korean
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