Publisher : The Korean Society of Mechanical Engineers
DOI : 10.22634/KSME-B.1922.214.171.1242
Title & Authors
Effects of interfacial shear stress on laminar-wavy film flow Kim, Byeong-Ju; Jeong, Eun-Su; Kim, Jeong-Heon;
In the present study the behavior of laminar-wavy film flowing down a vertical plate was studied analytically. The effects of film Reynolds number and interfacial shear stress on the mean film thickness, wave amplitude, wave length, and wave celerity were analysed. The anayltical results on the periodic-wave falling film showed good agreements with experimental data for Re < 100. As the film Reynolds number increased, mean film thickness, wave amplitude, and wave celerity increased, but wave length decreased. Depending on the direction of interfacial shear stress, the shape of wavy interface was disturbed significantly, especially for the intermediate-wave. As the interfacial shear stress increased, for the periodic-wave film, wave amplitude and wave celerity increased, but mean film thickness and wave length decreased.