JOURNAL BROWSE
Search
Advanced SearchSearch Tips
Analysis of Inductively Coupled Plasma using Electrostatic Probe and Fluid Simulation
facebook(new window)  Pirnt(new window) E-mail(new window) Excel Download
 Title & Authors
Analysis of Inductively Coupled Plasma using Electrostatic Probe and Fluid Simulation
Cha, Ju-Hong; Lee, Ho-Jun;
  PDF(new window)
 Abstract
Discharge characteristics of inductively coupled plasma were investigated by using electrostatic probe and fluid simulation. The Inductively Coupled Plasma source driven by 13.56 Mhz was prepared. The signal attenuation ratios of the electrostatic probe at first and second harmonic frequency was tuned in 13.56Mhz and 27.12Mhz respectively. Electron temperature, electron density, plasma potential, electron energy distribution function and electron energy probability function were investigated by using the electrostatic probe. Experiment results were compared with the fluid simulation results. Ar plasma fluid simulations including Navier-Stokes equations were calculated under the same experiment conditions, and the dependencies of plasma parameters on process parameters were well agreed with simulation results. Because of the reason that the more collision happens in high pressure condition, plasma potential and electron temperature got lower as the pressure was higher and the input power was higher, but Electron density was higher under the same condition. Due to the same reason, the electron energy distribution was widening as the pressure was lower. And the electron density was higher, as close to the gas inlet place. It was found that gas flow field significantly affect to spatial distribution of electron density and temperature.
 Keywords
13.56 Mhz;Fluid simulation;PECVD;Ar plasma;Inductively Coupled plasma;
 Language
Korean
 Cited by
 References
1.
Michael A. Lieberman, Allan J. Lichtenberg, "Principles of Plasma Discharges and Materials Processing" John Wiley&Sons (2005)

2.
Chen-Fu Chien, J.K. Wang, "Economic Analysis of 450 mm Wafer Migration" IEEE, Semiconductor Manufacturing, 1-4 (2007)

3.
Isaac D sudit, Francis F Chen, "RF compensated probes for high-density discharges", Plasma Sources Sci. Technol, 3, 162-168 (1994) crossref(new window)

4.
K Suzuki, K Nakamura, H Ohkubo, H Sugai, "Power transfer efficiency and mode jump in an inductive RF discharge ", Plasma Sources Sci. Technol. 713-20, (1998)

5.
R. J. Shul, G. B. McClellan, S. A. Casalnuovo, D.J. Rieger et al, "Inductively Coupled plasma etching of GAN" Applied Physics letters, 69, 1119 (1996) crossref(new window)

6.
G. R. Kornblum, L. de Galan, "spatial distribution of the temperature and the number densities of electrons and atomic and ionic species an inductively couple=d RF argon plasma" Spectrochimica Acta part B : Atomic spectroscopy, 32, 2, (1977)

7.
Valery A. Godyak, "Nonequilibrium EEDF in Gas Discharge Plasmas" IEEE Transaction on plasma science, vol. 34, 3, (2006)

8.
V.A Godyak "Measuring EEDF in Gas Discharge Plasmas" plasma-surface interactions and processing of Materials, 176, 95-134 (1990)

9.
COMSOL Multiphysics Version 4.4 User Guide (2013)

10.
E.J. Son, D.H Kim, and H.J Lee "Analysis of DC plasma using Electrostatic probe and fluid simulation" Trans. KIEE, vol 63, 10, 1417-1422, (2014)