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Fabrication of Metal Nanobridge Arrays using Sacrificial Silicon Nanowire
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 Title & Authors
Fabrication of Metal Nanobridge Arrays using Sacrificial Silicon Nanowire
Lee, Kook-Nyung; Lee, Kyoung-Gun; Jung, Suk-Won; Lee, Min-Ho; Seong, Woo-Kyeong;
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 Abstract
Novel fabrication method of nanobridge array of various materials was proposed using suspended silicon nanowire array as a sacrificial template structure. Nanobridges of various materials can be simply fabricated by direct deposition with thermal evaporation on the top of prefabricated suspended silicon nanobridge arrays, which are used as a sacrificial structure. Since silicon nanowire can be easily removed by selective dry etching, nanobridge arrays of an intended material are finally obtained. In this paper, metal nanobridges of Ti/Au, around 50-200 nm in thickness and width, 5-20 in length were fabricated to prove the advantages of the proposed nanowire or nanobridge fabrication method. The nanobridges of Ti/Au after complete removal of sacrificial silicon nanowire template were well-established and bending of nanobridge caused by the tensile stress was observed after silicon removing. Up to 50 nm and 10 of silicon nanowire in diameter and length respectively was also very useful for nanowire templates.
 Keywords
Metal nanobridge array;Suspended nanowires;Sacrificial silicon nanowires; etching;Nitride nanobridge;
 Language
English
 Cited by
1.
Stress-induced self-rolled metal/insulator bifilm microtube with micromesh walls, Journal of Micromechanics and Microengineering, 2013, 23, 1, 015003  crossref(new windwow)
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