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Bipolar Pulse Bias Effects on the Properties of MgO Reactively Deposited by Inductively Coupled Plasma-Assisted Magnetron Sputtering
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 Title & Authors
Bipolar Pulse Bias Effects on the Properties of MgO Reactively Deposited by Inductively Coupled Plasma-Assisted Magnetron Sputtering
Joo, Junghoon;
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 Abstract
MgO thin films were deposited by internal ICP-assisted reactive-magnetron sputtering with bipolar pulse bias on a substrate to suppress random arcs. Mg is reactively sputtered by a bipolar pulsed DC power of 100 kHz into ICP generated by a dielectrically shielded internal antenna. At a mass flow ratio of
 Keywords
ICP;Bipolar pulse bias;MgO;Reactive sputtering;
 Language
English
 Cited by
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