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Plasma Uniformity Analysis of Inductively Coupled Plasma Assisted Magnetron Sputtering by a 2D Voltage Probe Array
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 Title & Authors
Plasma Uniformity Analysis of Inductively Coupled Plasma Assisted Magnetron Sputtering by a 2D Voltage Probe Array
Joo, Junghoon;
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 Abstract
A real-time monitoring of immersed antenna type inductively coupled plasma (ICP) was done with a homemade 2 dimensional voltage probe array to check the uniformity of the plasma. Measured voltage values with a high impedance voltmeter are close to the floating potential of the plasma. As the substrate carrier was moving into a magnetron sputtering plasma diffusive from a size cathode, measured results showed reliably separation of plasma into the upper and lower empty space over the carrier. Infra red thermal imaging camera was used to observe the cross corner effect in situ without eroding a target to the end of the usage. 3 dimensional particle trace model was used to analyze the magnetron discharge`s behavior.
 Keywords
Inductively coupled plasma;Sputtering;Voltage probe;
 Language
English
 Cited by
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Non-Invasive Plasma Monitoring Tools and Multivariate Analysis Techniques for Sensitivity Improvement, Applied Science and Convergence Technology, 2014, 23, 6, 328  crossref(new windwow)
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