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Numerical Modeling of Floating Electrodes in a Plasma Processing System
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 Title & Authors
Numerical Modeling of Floating Electrodes in a Plasma Processing System
Joo, Junghoon;
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 Abstract
Fluid model based numerical analysis is done to simulate a plasma processing system with electrodes at floating potential. is a function of electron temperature, electron mass and ion mass. Commercial plasma fluid simulation softwares do not provide options for floating electrode boundary value condition. We developed a user subroutine in CFD-ACE+ and compared four different cases: grounded, dielectric, zero normal electric field and floating electric potential for a 2D-CCP (capacitively coupled plasma) with a ring electrode.
 Keywords
Numerical modeling;Capacitively coupled plasma;Floating potential;CFD-ACE+;
 Language
English
 Cited by
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한국표면공학회지, 2015. vol.48. 4, pp.179-184 crossref(new window)
1.
Analysis of contaminated QMS, cleaning and restoration of functions, Journal of the Korean institute of surface engineering, 2015, 48, 4, 179  crossref(new windwow)
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