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Fabrication of Ultra-smooth 10 nm Silver Films without Wetting Layer
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 Title & Authors
Fabrication of Ultra-smooth 10 nm Silver Films without Wetting Layer
Devaraj, Vasanthan; Lee, Jongmin; Baek, Jongseo; Lee, Donghan;
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Using conventional deposition techniques, we demonstrate a method to fabricate ultra-smooth 10 nm silver films without using a wetting layer or co-depositing another material. The argon working pressure plays a crucial role in achieving an excellent surface flatness for silver films deposited by DC magnetron sputtering on an InP substrate. The formation of ultra-smooth silver thin films is very sensitive to the argon pressure. At the optimum deposition condition, a uniform silver film with an rms surface roughness of 0.81 nm has been achieved.
Silver;Ultra-thin;Surface roughness;Sputtering;Atomic force microscopy;Nanophotonics;
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