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Green Photoresist Stripping Process with the Influence of Free Surface from Dip Withdrawal
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 Title & Authors
Green Photoresist Stripping Process with the Influence of Free Surface from Dip Withdrawal
Kim, Joon Hyun; Kim, Seung Hyun; Jeong, Byung Hyun; Joo, Gi-Tae; Kim, Young Sung;
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This paper describes a green stripping process to effectively strip the remaining DFR layer on a non-alkali-based ITO glass surface after an etching process. A stripper, water-soluble amine compound, is used to investigate the characteristics of stripping ability and to suggest a valid method for the green process. Increasing the composition (5-30% concentration) of the ethanol amine-based stripper was found to greatly reduce the stripping time applied in the dipping method. The composition (30%) achieved an excellent stripping effect and free-residue impurities. Additionally, it was possible to obtain the effect of stripping in a way to sustain the release before generating DFR sludge from the ITO glass surface by using dipping condition (stripping time) in the composition. An Additional stripping process (buffering) out of dipping can realize productivity improvement and cost reduction because of the higher proportion of re-use of the stripping solution used in the DFR removal step.
Dip coatings;Formulation;ITO Glass;Photoresist;Stripping process;
 Cited by
딥핑 방식을 이용한 ITO 표면의 효율적인 포토레지스트 박리공정,김준현;심재명;주기태;김용성;정병현;

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