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Effect of Processing Parameters on the Formation of Large Area Self-Assembled Monolayer of Polystyrene Beads by a Convective Self-Assembly Method
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  • Journal title : Korean Journal of Materials Research
  • Volume 25, Issue 12,  2015, pp.647-654
  • Publisher : The Materials Research Society of Korea
  • DOI : 10.3740/MRSK.2015.25.12.647
 Title & Authors
Effect of Processing Parameters on the Formation of Large Area Self-Assembled Monolayer of Polystyrene Beads by a Convective Self-Assembly Method
Seo, Ahn-na; Choi, Ji-Hwan; Pyun, Jae-chul; Kim, Won Mok; Kim, Inho; Lee, Kyeong-Seok;
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Self-assembled monolayers(SAM) of microspheres such as silica and polystyrene(PS) beads have found widespread application in photonic crystals, sensors, and lithographic masks or templates. From a practical viewpoint, setting up a high-throughput process to form a SAM over large areas in a controllable manner is a key challenging issue. Various methods have been suggested including drop casting, spin coating, Langmuir Blodgett, and convective self-assembly(CSA) techniques. Among these, the CSA method has recently attracted attention due to its potential scalability to an automated high-throughput process. By controlling various parameters, this process can be precisely tuned to achieve well-ordered arrays of microspheres. In this study, using a restricted meniscus CSA method, we systematically investigate the effect of the processing parameters on the formation of large area self-assembled monolayers of PS beads. A way to provide hydrophilicity, a prerequisite for a CSA, to the surface of a hydrophobic photoresist layer, is presented in order to apply the SAM of the PS beads as a mask for photonic nanojet lithography.
convective self-assembly method;polystyrene bead;large area monolayer;high-throughput process;
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