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Analysis of Sputter-Deposited SnO thin Film with SnO/Sn Composite Target
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 Title & Authors
Analysis of Sputter-Deposited SnO thin Film with SnO/Sn Composite Target
Kim, Cheol; Kim, Sungdong; Kim, Sarah Eunkyung;
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Tin oxides have been studied for various applications such as gas detecting materials, transparent electrodes, transparent devices, and solar cells. p-type SnO is a promising transparent oxide semiconductor because of its high optical transparency and excellent electrical properties. In this study, we fabricated p-type SnO thin film using rf magnetron sputtering with an SnO/Sn composite target; we examined the effects of various oxygen flow rates on the SnO thin films. We fundamentally investigated the structural, optical, and electrical properties of the p-type SnO thin films utilizing X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), UV/Vis spectrometry, and Hall Effect measurement. A p-type SnO thin film of $P_{O2}
SnO;tin oxide;reactive sputtering;composite target;p-type thin film;
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