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Non-HF Type Etching Solution for Slimming of Flat Panel Display Glass
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  • Journal title : Applied Chemistry for Engineering
  • Volume 27, Issue 1,  2016, pp.101-109
  • Publisher : The Korean Society of Industrial and Engineering Chemistry
  • DOI : 10.14478/ace.2016.1005
 Title & Authors
Non-HF Type Etching Solution for Slimming of Flat Panel Display Glass
Lee, Chul-Tae;
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The purpose of this research was to develop a flat panel display device`s glass etchant which can replace hydrofluoric acid. The glass etchant was composed of 18~19% wt% of ammonium hydrogen fluoride, 24~25 wt% of sulfuric acid, 45~46 wt% of water, 4~5 wt% of sulfate and 7~8 wt% of fluoro-silicate. By replenishing the etchant which has the amount of 5% of initial solution`s mass, it was possible to reuse the etchant continuously. The developed etchant showed of etching rate at . The reusable etchant, with replenishing 5% of initial etchant mass showed the stable etching rate, which has the deviation of less than etching rate. The glass surface of flat panel display device created from our etching process was in good condition with any defects such as pin hole and dimple.
non-hydrogen fluoride;etching;glass slimming;flat pannel disply;
 Cited by
J. Y. Byun, A Study on Etching of EAGLE2000TM LCD Glass by HF-HCl Mixed Solutions, J. Microelectronics & Packing Society, 15, 41-46 (2008).

S. H. Cho, S. W. Youn, and C. G. Kang, Observation of Growth Behavior of Induced Hillock for Nano/Micro Patterning on Surface of Borosilicate with Etching Time and Load, Proceedings of the Korean Society for Technology of Plasticy Autumn Conference, October 11-14, Seoul Korea (2005).

H. T. Kim, Glass Thinning by Fluoride Based Compounds Solution with Low Hydrofluoric acid Concentration, Master Dissertation, Hoseo University, Asan, Korea (2009).

Techno Semichem Corporation, Etching Composition for LCD Glass, KOR Patent 0052475 (2005).

R. A. Bellman, R. W. Davis, J. C. Lapp, and R. M. Walton, Chemical Durability of EAGLE $XG^{TM}$ in LCD Dry Etch Processes, Corning Inc, Sullivan Park, Corning, P-48.2, NY, USA (2005).

C. Iliescu, B. Chena, and J. Miao, On the wet etching of Pyrex glass, Sensors and Actuators, A143, 154-161 (2008).

Dongwoo Fine-Chem, Etching solution composition, KOR Patent 0061610 (2008).

Takoma technology corporation, Etching composition, KOR Patent 0112782 (2009).

Chemtronics Corporation, Etchant Composition for Glass Substrate, KOR Patent 0124792 (2007).

Exax Corporation, Echant composition for glass of flat panel display, KOR Patent 0082540 (2007).