JOURNAL BROWSE
Search
Advanced SearchSearch Tips
Improvement of the Field Emission Stability of Carbon Nanotube Paste Emitter by Post-treatments
facebook(new window)  Pirnt(new window) E-mail(new window) Excel Download
  • Journal title : Carbon letters
  • Volume 10, Issue 3,  2009, pp.234-238
  • Publisher : Korean Carbon Society
  • DOI : 10.5714/CL.2009.10.3.234
 Title & Authors
Improvement of the Field Emission Stability of Carbon Nanotube Paste Emitter by Post-treatments
Choi, Young-Chul; Jeong, Mun-Seok;
  PDF(new window)
 Abstract
The field emitters were fabricated by screen-printing of carbon nanotube paste, and their emission stabilities were evaluated. It was found that the emission stability measured in a sealed device is much higher than that measured in a vacuum chamber in spite of similar pressure. This was because oxygen gas was scarcely remained in the sealed device, while the gas is continuously supplied into the vacuum chamber during the stability measurement. It was found that the plasma treatment etched the protruded CNTs, resulting in the uniform height of CNT tips. As a result, the stability was increased remarkably. It was also found that the stability of CNT paste emitter was improved by electrical aging and that the optimum condition for the aging was varied with the size of emitter.
 Keywords
Carbon nanotube paste;Emission stability;Sealed device;Post-treatment;
 Language
English
 Cited by
 References
1.
Rao, A. M.; Jacques, D.; Haddon, R. C.; Zhu, W.; Bower, C.; Jin, S. Appl. Phys. Lett. 2000, 76, 3813. crossref(new window)

2.
Cha, O. H.; Jeong, M. S.; Byeon, C. C.; Jeong, H.; Han, J. H.; Choi, Y. C.; An, K. H.; Oh, K.; Kim, K. K.; Lee, Y. H. Carbon Lett. 2009, 10, 9. crossref(new window)

3.
Kwon, S. J. Jpn. J. Appl. Phys. 2007, 46, 5988. crossref(new window)

4.
Kim, Y. C.; Yoo, E. H. Jpn. J. Appl. Phys. 2005, 44, L454. crossref(new window)

5.
Nam, J. W.; Cho, S. H.; Choi, Y. C.; Ha, J. S.; Park, J. H.; Choe, D. H.; Yoo, J. B.; Park, J. H. Diamond Relat. Mater. 2005, 14, 2089. crossref(new window)

6.
Choi, Y. C.; Jeong, K. S.; Han, I. T.; Kim, H. J.; Jin, Y. W.; Kim, J. M.; Lee, B. G.; Park, J. H.; Choe, D. H. Appl. Phys. Lett. 2006, 88, 263504. crossref(new window)

7.
Seelaboyina, R.; Huang, J.; Choi, W. B. Appl. Phys. Lett. 2006, 88, 194104. crossref(new window)

8.
Park, J. H.; Moon, J. S.; Nam, J. W.; Yoo, J. B.; Park, C. Y.; Kim, J. M.; Park, J. H.; Lee, C. G.; Choe, D. H. Diamond Ralat. Mater. 2005, 14, 2113. crossref(new window)

9.
Qin, Y.; Hu, M. Appl. Surf. Sci. 2008, 254, 1757. crossref(new window)

10.
Kim, W. S.; Lee, J.; Jeong, T. W.; Heo, J. N.; Kong, B. Y.; Jin, Y. W.; Kim, J. M.; Cho, S. H.; Park, J. H.; Choe, D. H. Appl. Phys. Lett. 2005, 87, 163112. crossref(new window)

11.
Liang, X. H.; Deng, S. Z.; Xu, N. S.; Chen, J.; Huang, N. Y.; She, J. C. Appl. Phys. Lett. 2006, 88, 111501. crossref(new window)

12.
Zhu, X. Y.; Lee, S. M.; Lee, Y. H.; Frauenheim, T. Phys. Rev. Lett. 2000, 85, 2757. crossref(new window)

13.
Purcell, S. T.; Vincent, P.; Journet C.; Binh, V. T. Phys. Rev. Lett. 2002, 88, 105502. crossref(new window)

14.
Choi, G. S.; Son, K. H.; Kim, D. J. Microelectronic Engineering 2003, 66, 206. crossref(new window)

15.
Jankowski, A.; Hayes, J.; Morse, J.; Ferreira, J. Thin Solid Films 1999, 355, 194. crossref(new window)

16.
Choi, Y. C.; Shin, Y. M.; Lee, Y. H.; Lee, B. S.; Park, G. S.; Choi, W. B.; Lee, N. S.; Kim, J. M. Appl. Phys. Lett. 2000, 76, 2367. crossref(new window)

17.
Lee, N. S.; Chung, D. S.; Han, I. T.; Kang, J. H.; Choi, Y. S.; Kim, H. Y.; Park, S. H.; Jin, Y. W.; Yi, W. K.; Yun, M. J.; Jung, J. E.; Lee, C. J.; You, J. H.; Jo, S. H.; Lee, C. G.; Kim, J. M. Diamond Relat. Mater. 2001, 10, 265. crossref(new window)

18.
Jeong, H. J.; Lim, S. C.; Kim, K. S.; Lee, Y. H. Carbon 2004, 42, 3065.