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Parametric Study of Methanol Chemical Vapor Deposition Growth for Graphene
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  • Journal title : Carbon letters
  • Volume 13, Issue 4,  2012, pp.205-211
  • Publisher : Korean Carbon Society
  • DOI : 10.5714/CL.2012.13.4.205
 Title & Authors
Parametric Study of Methanol Chemical Vapor Deposition Growth for Graphene
Cho, Hyunjin; Lee, Changhyup; Oh, In Seoup; Park, Sungchan; Kim, Hwan Chul; Kim, Myung Jong;
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 Abstract
Methanol as a carbon source in chemical vapor deposition (CVD) graphene has an advantage over methane and hydrogen in that we can avoid optimizing an etching reagent condition. Since methanol itself can easily decompose into hydrocarbon and water (an etching reagent) at high temperatures [1], the pressure and the temperature of methanol are the only parameters we have to handle. In this study, synthetic conditions for highly crystalline and large area graphene have been optimized by adjusting pressure and temperature; the effect of each parameter was analyzed systematically by Raman, scanning electron microscope, transmission electron microscope, atomic force microscope, four-point-probe measurement, and UV-Vis. Defect density of graphene, represented by D/G ratio in Raman, decreased with increasing temperature and decreasing pressure; it negatively affected electrical conductivity. From our process and various analyses, methanol CVD growth for graphene has been found to be a safe, cheap, easy, and simple method to produce high quality, large area, and continuous graphene films.
 Keywords
graphene;synthesis;methanol;low pressure chemical vapor deposition;large area;
 Language
English
 Cited by
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