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Continuous Process for the Etching, Rinsing and Drying of MEMS Using Supercritical Carbon Dioxide
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  • Journal title : Korean Chemical Engineering Research
  • Volume 53, Issue 5,  2015, pp.557-564
  • Publisher : The Korean Institute of Chemical Engineers
  • DOI : 10.9713/kcer.2015.53.5.557
 Title & Authors
Continuous Process for the Etching, Rinsing and Drying of MEMS Using Supercritical Carbon Dioxide
Min, Seon Ki; Han, Gap Su; You, Seong-sik;
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 Abstract
The previous etching, rinsing and drying processes of wafers for MEMS (microelectromechanical system) using SC- (supercritical-) consists of two steps. Firstly, MEMS-wafers are etched by organic solvent in a separate etching equipment from the high pressure dryer and then moved to the high pressure dryer to rinse and dry them using SC-. We found that the previous two step process could be applied to etch and dry wafers for MEMS but could not confirm the reproducibility through several experiments. We thought the cause of that was the stiction of structures occurring due to vaporization of the etching solvent during moving MEMS wafer to high pressure dryer after etching it outside. In order to improve the structure stiction problem, we designed a continuous process for etching, rinsing and drying MEMS-wafers using SC- without moving them. And we also wanted to know relations of states of carbon dioxide (gas, liquid, supercritical fluid) to the structure stiction problem. In the case of using gas carbon dioxide (3 MPa, ) as an etching solvent, we could obtain well-treated MEMS-wafers without stiction and confirm the reproducibility of experimental results. The quantity of rinsing solvent used could be also reduced compared with the previous technology. In the case of using liquid carbon dioxide (3 MPa, , we could not obtain well-treated MEMS-wafers without stiction due to the phase separation of between liquid carbon dioxide and etching co-solvent(acetone). In the case of using SC- (7.5 Mpa, ), we had as good results as those of the case using gas-. Besides the processing time was shortened compared with that of the case of using gas-.
 Keywords
Supercritical;Continuous;Etching;Rinsing;
 Language
Korean
 Cited by
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