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Analysis of Tunneling Current of Asymmetric Double Gate MOSFET for Ratio of Top and Bottom Gate Oxide Film Thickness
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 Title & Authors
Analysis of Tunneling Current of Asymmetric Double Gate MOSFET for Ratio of Top and Bottom Gate Oxide Film Thickness
Jung, Hakkee;
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 Abstract
This paper analyzes the deviation of tunneling current for the ratio of top and bottom gate oxide thickness of short channel asymmetric double gate(DG) MOSFET. The ratio of tunneling current for off current significantly increases if channel length reduces to 5 nm. This short channel effect occurs for asymmetric DGMOSFET having different top and bottom gate oxide structure. The ratio of tunneling current in off current with parameters of channel length and thickness, doping concentration, and top/bottom gate voltages is calculated in this study, and the influence of tunneling current to occur in short channel is investigated. The analytical potential distribution is obtained using Poisson equation and tunneling current using WKB(Wentzel-Kramers-Brillouin). As a result, tunneling current is greatly changed for the ratio of top and bottom gate oxide thickness in short channel asymmetric DGMOSFET, specially according to channel length, channel thickness, doping concentration, and top/bottom gate voltages.
 Keywords
Tunneling current;Poisson equation;Top/bottom oxide thickness;WKB approximation;
 Language
Korean
 Cited by
 References
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