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Fabrication of the accelerometer using the nano-gap trench etching
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 Title & Authors
Fabrication of the accelerometer using the nano-gap trench etching
Kim, Hyeon-Cheol; Kwon, Hee-jun;
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 Abstract
This paper proposes a novel fabrication method for a capacitive type micro-accelerometer with uniform nano-gap using photo-assisted electro-chemical etching. The sensitivity of the accelerometer should be improved while the electrodes between the inertial mass and the sensing comb should be narrowed. In this paper the nano-gap trench structure is fabricated using the photo-assisted electrochemical etching method. The sensor was designed and analysed using ANSYS simulator. The characteristics of the etching were observed according to the dc bias, the light intensity, the composition of the solution, the temperature of the solution, and the pattern pitch variation. The optimum etching conditions were dc bias of 2V, Blue LED of 20mA, 49wt% HF:DMF:D.I.Water
 Keywords
Accelerometer;Capacitive sensor;Electrochemical etching;LED;Nano-gap trench;
 Language
Korean
 Cited by
 References
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