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The Effect of in situ Ultraviolet Irradiation on the Chemical Vapor Deposited ZnO Thin Films
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 Title & Authors
The Effect of in situ Ultraviolet Irradiation on the Chemical Vapor Deposited ZnO Thin Films
Kim, Bo-Seok; Baik, Seung Jae;
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ZnO thin films have wide application areas due to its versatile properties as transparent conductors, wide-bandgap n-type semiconductors, gas sensor materials, and etc. We have performed a systematic investigation on ultraviolet-assisted CVD (chemical vapor deposition) method. Ultraviolet irradiation during the deposition of ZnO causes chemical reduction on the growing surface; which results in the reduction of the deposition rate, increase in the surface roughness, and decrease of the electrical resistivity. These effects produce larger characteristic variation with various deposition conditions in terms of surface morphology and optical/electrical properties compared to normal CVD deposited ZnO thin films. This versatile controllability of ultraviolet-assisted CVD can provide a larger processing options in the fabrication of nano-structured materials and flexible device applications.
Chemical vapor deposition;ZnO;Ultraviolet;
 Cited by
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