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Improvement on Surface and Electrical Properties of Polymer Insulator Coated TiO2 Thin Film by Atomic Layer Deposition
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 Title & Authors
Improvement on Surface and Electrical Properties of Polymer Insulator Coated TiO2 Thin Film by Atomic Layer Deposition
Kim, Nam-Hoon; Park, Yong Seob;
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 Abstract
Titanium oxide () thin films were synthesized on polymer insulator and Si substrates by atomic layer deposition (ALD) method. The surface and electrical properties of films synthesized at various ALD cycle numbers were investigated. The synthesized films exhibited higher contact angle and smooth surface. The contact angle of films was increased with the increase of ALD-cycle number. Also, the rms surface roughness of films was slightly rough with the increase of ALD-cycle number. The leakage current on film surface synthesized at various conditions were uniformed, and the values were decreased with the increase of ALD-cycle number. In the results, the performance of films for self-cleaning critically depended on a number of ALD-cycle.
 Keywords
;Atomic layer deposition (ALD);Contact angle;Leakage current;Rms surface roughness;
 Language
Korean
 Cited by
 References
1.
J. M. Kim, T. W. Nam, S. J. Lim, Y. G. Seol, N. E. Lee, D. Y. Kim, and H. Kim, Appl. Phys. Lett., 98, 142113 (2011). [DOI: http://dx.doi.org/10.1063/1.3577607] crossref(new window)

2.
E. Guziewicz, I. A. Kowalik, M. Godlewski, K. Kopalko, V. Osinniy, A. Wojcik, S. Yatsunenko, E. Usakowska, W. Paszkowicz, and M. Guziewicz, J. Appl. Phys., 103, 033515 (2008). [DOI: http://dx.doi.org/10.1063/1.2836819] crossref(new window)

3.
J. Sheng, N. Yoshida, J. Karasawa, and T. Fukami, Sens. Actuators B, 41, 131 (1997). [DOI: http://dx.doi.org/10.1016/S0925-4005(97)80285-7] crossref(new window)

4.
J. K. Luo, Y. Q. Fu, H. R. Le, J A. Williams, S. M. Spearing, and W. I. Milne, J. Micromech. Microeng., 17, S147 (2007). [DOI: http://dx.doi.org/10.1088/0960-1317/17/7/S12] crossref(new window)

5.
D. Sheeja, B. K. Tay, S. P. Lau, and X. Shi, Wear, 249, 433 (2001). [DOI: http://dx.doi.org/10.1016/S0043-1648(01)00541-5] crossref(new window)

6.
M. Schlatter, Diam. Relat. Mater., 11, 1781 (2002). [DOI: http://dx.doi.org/10.1016/S0925-9635(02)00166-8]

7.
J. Aarik, A. Aidla, T. Uustare, M. Ritala, and M. Leskela, Appl. Surf. Sci., 161, 385 (2000). [DOI: http://dx.doi.org/10.1016/S0169-4332(00)00274-9] crossref(new window)

8.
J. P. Lee and M. M. Sung, J. Am. Chem. Soc., 126, 28 (2004). [DOI: http://dx.doi.org/10.1021/ja038769+] crossref(new window)

9.
T. Suntola, Thin Solid Films, 216, 84 (1992). [DOI: http://dx.doi.org/10.1016/0040-6090(92)90874-B] crossref(new window)

10.
W. R. Hansen and K. Autumn, Proc. Natl. Acad. Sci. USA, 102, 385 (2005). [DOI: http://dx.doi.org/10.1073/pnas.0408304102] crossref(new window)

11.
M. Ma and R. M. Hill, Curr. Opin. Colloid Interface Sci., 11, 193 (2006). [DOI: http://dx.doi.org/10.1016/j.cocis.2006.06.002] crossref(new window)

12.
M. Heikkila, E. Puukilainen, M. Ritala, M. Leskela, Journal of Photochemistry and Photobiology A: Chemistry, 204, 200 (2009). [DOI: http://dx.doi.org/10.1016/j.jphotochem.2009.03.019] crossref(new window)

13.
A. Fujishima, X. Zhang, and D. A. Tryk, Surface Science Reports, 63, 515 (2008). [DOI: http://dx.doi.org/10.1016/j.surfrep.2008.10.001] crossref(new window)

14.
G. J. Choi, S. K. Kim, S. J. Won, H. J. Kim, and C. S. Hwang, Journal of The Electrochemical Society, 156, G138-G143 (2009). [DOI: http://dx.doi.org/10.1149/1.3169516] crossref(new window)

15.
S. K. Kim, W. D. Kim, K. M. Kim, C. S. Hwang, and J. Jeong, Appl. Phys. Lett., 85, 4112 (2004). [DOI: http://dx.doi.org/10.1063/1.1812832] crossref(new window)

16.
S. K. Kim, G. W. Hwang, W. D. Kim, and C. S. Hwang, Electrochem. Solid-State Lett., 9, F5 (2006). [DOI: http://dx.doi.org/10.1149/1.2131241] crossref(new window)