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Homologue Patterns of Polychlorinated Naphthalenes (PCNs) formed via Chlorination in Thermal Process
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 Title & Authors
Homologue Patterns of Polychlorinated Naphthalenes (PCNs) formed via Chlorination in Thermal Process
Ryu, Jae-Yong; Kim, Do-Hyong; Mulholland, James A.; Jang, Seong-Ho; Choi, Chang-Yong; Kim, Jong-Bum;
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The chlorination pattern of naphthalene vapor when passed through a 1 cm particle bed of 0.5% (mass) copper (II) chloride () mixed with silicon dioxide () was studied. Gas streams consisting of 92% (molar) , 8% and 0.1% naphthalene vapor were introduced to an isothermal flow reactor containing the particle bed. Chlorination of naphthalene was studied from 100 to at a gas velocity of 2.7 cm/s. Mono through hexachlorinated naphthalene congeners were observed at whereas a broader distribution of polychlorinated naphthalenes (PCNs) including hepta and octachlorinated naphthalenes was observed at . PCN production was peak at with 3.07% (molar) yield, and monochloronaphthalene (MCN) congeners were the major products at two different temperatures. In order to assess the effect of a residence time on naphthalene chlorination, an experiment was also conducted at with a gas velocity of 0.32 cm/s. The degree of naphthalene chlorination increased as a gas velocity decreased.
PCN (polychlorinated naphthalene);Chlorination;Copper (II) chloride;Homologue distribution;
 Cited by
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