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A Study for Oxidants Generation on Oxygen-plasma Discharging Process Discharging System
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 Title & Authors
A Study for Oxidants Generation on Oxygen-plasma Discharging Process Discharging System
Kim, Dong-Seog; Park, Young-Seek;
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This study carried out a laboratory scale plasma reactor about the characteristics of chemically oxidative species (, and ) produced in dielectric barrier discharge plasma. It was studied the influence of various parameters such as gas type, voltage, oxygen flow rate, electric conductivity and pH of solution for the generation of the oxidant. and .) and was measured by direct assay using absorption spectrophotometry. OH radical was measured indirectly by measuring the degradation of the RNO (N-Dimethyl-4-nitrosoaniline, indicator of the generation of OH radical). The experimental results showed that the effect of influent gases on RNO degradation was ranked in the following order: oxygen > air >> argon. The optimum voltage for RNO degradation were 90 V. As the increased of voltage, generated and concentration were increased. The intensity of the UV light emitted from oxygen-plasma discharge was lower than that of the sun light. The generated hydrogen peroxide concentration and ozone concentration was not high. Therefore it is suggested that the main mechanism of oxidation of the oxygen-plasma process is OH radical. The conductivity of the solution did not affected the generation of oxidative species. The higher pH, the lower and generation were observed. However, RNO degradation was not varied with the change of the solution pH.
Dielectric barrier discharge plasma;Oxydants;OH radical;;;
 Cited by
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