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Surface wave excited plasma CVD technologies for the synthesis of carbon nanomaterials
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  • Journal title : Vacuum Magazine
  • Volume 2, Issue 4,  2015, pp.16-26
  • Publisher : The Korean Vacuum Society
  • DOI : 10.5757/vacmac.2.4.16
 Title & Authors
Surface wave excited plasma CVD technologies for the synthesis of carbon nanomaterials
Kim, Jaeho;
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 Abstract
Carbon nanomaterials including nanocrystalline diamond and graphene films are expected to play a core role in century industries due to their amazing physicochemical properties. To achieve their practical utilization and industrialization, the development of their mass production technologies is strongly required. Recently, a surface wave excited plasma (SWP) which is produced using microwaves has been attracting special attentions as a candidate for the mass production technology of carbon nanomaterials. SWP can allow a low-temperature large-area plasma chemical vapor deposition (CVD) system. Here, this article introduces the promising SWP-CVD technology. Plasma characteristics in a SWP will be introduced in detail to help understanding how to use and control a SWP as a plasma source for CVD applications.
 Keywords
 Language
Korean
 Cited by
 References
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