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High Speed Direct Bonding of Silicon Wafer Using Atmospheric Pressure Plasma
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 Title & Authors
High Speed Direct Bonding of Silicon Wafer Using Atmospheric Pressure Plasma
Cha, Yong-Won; Park, Sang-Su; Shin, Ho-Jun; Kim, Yong Taek; Lee, Jung Hoon; Suh, Il Woong; Choa, Sung-Hoon;
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 Abstract
In order to achieve a high speed and high quality silicon wafer bonding, the room-temperature direct bonding using atmospheric pressure plasma and sprayed water vapor was developed. Effects of different plasma fabrication parameters, such as flow rate of gas, flow rate of CDA (clear dry air), gap between the plasma head and wafer surface, and plasma applied voltage, on plasma activation were investigated using the measurements of the contact angle. Influences of the annealing temperature and the annealing time on bonding strength were also investigated. The bonding strength of the bonded wafers was measured using a crack opening method. The optimized condition for the highest bonding strength was an annealing temperature of and an annealing time of 2 hours. For the plasma activation conditions, the highest bonding strength was achieved at the plasma scan speed of 30 mm/sec and the number of plasma treatment of 4 times. After optimization of the plasma activation conditions and annealing conditions, the direct bonding of the silicon wafers was performed. The infrared transmission image and the cross sectional image of bonded interface indicated that there is no void and defects on the bonded wafers. The bonded wafer exhibited a bonding strength of average .
 Keywords
Silicon wafer;direct bonding;atmospheric pressure;plasma;bonding strength;
 Language
Korean
 Cited by
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