JOURNAL BROWSE
Search
Advanced SearchSearch Tips
Influence of TiO2 Buffer Layer on the Electrical and Optical Properties of IGZO/TiO2 Bi-layered Films
facebook(new window)  Pirnt(new window) E-mail(new window) Excel Download
 Title & Authors
Influence of TiO2 Buffer Layer on the Electrical and Optical Properties of IGZO/TiO2 Bi-layered Films
Moon, Hyun-Joo; Kim, Daeil;
  PDF(new window)
 Abstract
IGZO single layer and bi-layered films were deposited on glass substrate at room temperature with radio frequency magnetron sputtering to investigate the effect of buffer layer on the electrical and optical properties of the films. For all deposition, the thickness of IGZO and Buffer layer was kept at 100 and 5 nm, respectively. In a comparison of figure of merit, IGZO films with a 5-nm-thick buffer layer show the higher figure of merit () than that of the IGZO single layer films () due to the enhanced optical transmittance and the decreased sheet resistance of the films. The observed results mean that a 5 nm thick buffer layer in the films results in better electrical and optical performance than conventional IGZO single layer films.
 Keywords
IGZO;;Magnetron sputter;AFM;Figure of Merit;
 Language
Korean
 Cited by
1.
증착율 변화에 따른 TIO 박막의 전기적, 광학적 특성 변화,문현주;김대일;

열처리공학회지, 2016. vol.29. 2, pp.62-65 crossref(new window)
1.
Influence of Deposition Rate on the Optoelectrical Properties of TIO Thin Films, Journal of the Korean Society for Heat Treatment, 2016, 29, 2, 62  crossref(new windwow)
 References
1.
Y. J. Lee, S. B. Heo, H. M. Lee, Y. S. Kim and D. Kim : J. Kor. Soc. Heat Treat. 25 (2012) 244. crossref(new window)

2.
S. Song, T. Yang, J. Liu, Y. Xin, Y. Li and S. Han : Appl. Surf. Sci. 257 (2011) 7061. crossref(new window)

3.
N. Tiwari, H. P. D. Shieh and P. T. Liu : Mater. Lett. 151 (2015) 53. crossref(new window)

4.
S. Y. Kim, S. K. Kim, S. H. Kim, J. H. Jeon, T. K. Gong, D. I. Son, D. H. Choi and D. Kim : J. Kor. Soc. Heat Treat. 27 (2014) 175. crossref(new window)

5.
H. Hsu, C. Chang, C. Cheng, S. Chiou and C. Huang : IEEE Electron Dev Lett 35 (2014) 87. crossref(new window)

6.
J. H. Jeon, T. K. Gong, S. K. Kim, S. H. Kim, S. Y. Kim, D. H. Choi, D. I. Son and D. Kim : J. Alloys and Compd. 639 (2015) 1. crossref(new window)

7.
김승홍 : 전자빔 조사 효과에 따른 IGZO/ZTO 적층 박막의 전기적, 광학적 물성 연구, 울산대학교 석사학위논문 (2014).

8.
S. Kim and D. Kim : Ceram. Int. 41 (2015) 2770. crossref(new window)

9.
H. Pu, Q. Zhou, L. Yue and Q. Zhang : Appl. Surf. Sci. 283 (2013) 722. crossref(new window)

10.
S. Kim, S. Kim, S. Kim, J. Jeon, T. Gong, D. Kim, D. Yoon, and D. Choi : Trans. Electr. Electron. Mater. 15 (2014) 198. crossref(new window)

11.
J. Tanc : Amorphous and Liquid Semiconductor, Plenum, New York, 1974.

12.
P. Prepelita, V. Craciun, F. Garoi and A. Stacu : Appl. Surf. Sci. 352 (2015) 23. crossref(new window)

13.
D. Kim, Displays 31 (2010) 155. crossref(new window)

14.
G. Haacke : J. Appl. Phys. 47 (1976) 4086. crossref(new window)