JOURNAL BROWSE
Search
Advanced SearchSearch Tips
Influence of Deposition Rate on the Optoelectrical Properties of TIO Thin Films
facebook(new window)  Pirnt(new window) E-mail(new window) Excel Download
 Title & Authors
Influence of Deposition Rate on the Optoelectrical Properties of TIO Thin Films
Moon, Hyun-Joo; Kim, Daeil;
  PDF(new window)
 Abstract
TIO thin films were deposited on the poly-carbonate substrates with RF magnetron sputtering under different sputtering power condition to investigate the influence of deposition rate on the electrical and optical properties of the films. Although, all films have the similar carrier concentration, the films prepared at a lower deposition rate of 4 nm/min show a higher mobility of due to the low surface roughness. In addition, optical transmittance is also influenced by a deposition rate. Based on the figure of merit, it can be concluded that the lower deposition rate effectively enhances the opto-electrical performance of IGZO films for use as transparent conducting oxides in flexible display applications.
 Keywords
IGZO;magnetron sputtering;deposition rate;figure of merit;
 Language
Korean
 Cited by
1.
Ni 층간박막에 따른 SnO2 박막의 전기적, 광학적 물성 변화,송영환;엄태영;김대일;

열처리공학회지, 2016. vol.29. 5, pp.216-219 crossref(new window)
2.
전자빔 표면조사에 따른 SnO2 박막의 전기적, 광학적 특성 연구,송영환;문현주;김대일;

열처리공학회지, 2016. vol.29. 3, pp.109-112 crossref(new window)
3.
증착 후 진공열처리에 따른 SnO2 박막의 특성 변화,송영환;문현주;김대일;

열처리공학회지, 2016. vol.29. 4, pp.163-167 crossref(new window)
1.
Influence of Post-depsotion Vacuum Annealing on the Properties of SnO2Thin Films, Journal of the Korean Society for Heat Treatment, 2016, 29, 4, 163  crossref(new windwow)
2.
Effect of Electron Irradiation on the Electrical and Optical Properties of SnO2Thin Films, Journal of the Korean Society for Heat Treatment, 2016, 29, 3, 109  crossref(new windwow)
3.
Influence of Ni Interlayer on the Electrical and Optical Properties of SnO2thin films, Journal of the Korean Society for Heat Treatment, 2016, 29, 5, 216  crossref(new windwow)
 References
1.
S. H. Kim and D. Kim : Ceram. Int. 41 (2015) 2770. crossref(new window)

2.
S. K. Kim and D. Kim : J. Kor. Soc. Heat Treat. 27 (2014) 225. crossref(new window)

3.
S. Venkatachalam, Y. Iida and Y. Kanno : Superlattices and Microstructures 44 (2008) 127. crossref(new window)

4.
A. Chaoumead, B. H. Joo, D. J. Kwak and Y. M. Sung : Appl. Surf. Sci. 275 (2013) 227. crossref(new window)

5.
G. Haacke : J. Appl. Phys. 47 (1976) 4086. crossref(new window)

6.
J. Jeon, T. K. Gong, Y. M. Kong, H. M. Lee and D Kim : Electron. Mater. Lett. 11 (2015) 481. crossref(new window)

7.
H. J. Moon and D. Kim : J. Kor. Soc. Heat Treat. 28 (2015) 291. crossref(new window)

8.
P. Prepelita, V. Craciun, F. Garoi and A. Stacu : Appl. Surf. Sci. 352 (2015) 23. crossref(new window)

9.
J. Tanc : Amorphous and Liquid Semiconductor, Plenum, New York, 1974.