JOURNAL BROWSE
Search
Advanced SearchSearch Tips
Effect of Electron Irradiation on the Electrical and Optical Properties of SnO2 Thin Films
facebook(new window)  Pirnt(new window) E-mail(new window) Excel Download
 Title & Authors
Effect of Electron Irradiation on the Electrical and Optical Properties of SnO2 Thin Films
Song, Young-Hwan; Moon, Hyun-Joo; Kim, Daeil;
  PDF(new window)
 Abstract
We have considered the influence of electron irradiation on the optical and electrical properties of thin films deposited with reactive RF magnetron sputtering. After deposition, the films electron irradiated at 300 eV shows a lower sheet resistance of and the optical transmittance in a visible wave length region also influenced with the electron irradiation energy. The film that electron irradiated at 400 eV shows a higher optical transmittance of 82.6% in this study. By comparison of figure of merit, it is concluded that the post-deposition electron irradiation at 300 eV is the optimum condition for the enhancement of opto-electrcal performance of thin film in this study.
 Keywords
;Thin film;Magentron sputtering;Electron irradiation;Figure of merit;
 Language
Korean
 Cited by
 References
1.
L. Liu, S. Ma, H. Wu, B. Zhu, H. Yang, J. Tang and X. Zhao : Mater. Lett., 149 (2015) 43. crossref(new window)

2.
C. Ke, W. Zhu, J. S. Pan and Z. Yang : Curr. Appl. Phys., 11 (2011) 306. crossref(new window)

3.
A. H. Ali, A. Shuhaimi and Z. Hassan : Appl. Surf. Sci., 288 (2014) 599. crossref(new window)

4.
Y. J. Jo, C. H. Hong and J. S. Kwak : Curr. Appl. Phys., 11 (2011) 143.

5.
Y. Kim, S. Heo, H. Lee, Y. Lee and D. Kim : Appl. Surf. Sci., 258 (2012) 3903. crossref(new window)

6.
G. Haacke : J. Appl. Phys., 47 (1976) 4086. crossref(new window)

7.
H. J. Moon and D. Kim : J. Korean. Soc. Heat Treat., 29 (2016) 62. crossref(new window)

8.
H. Koseoglu, F. Turkoglu, M. Kurt, M. D. Yaman, F. G. Akca, G. Aygun, and L. Ozyuzer : Vacuum 120 (2015) 8. crossref(new window)

9.
Y. Uno, A. Okada, K. Uemura, P. Raharjo, T. Furukawa, K. Karato, Precision Eng., 29 (2005) 449. crossref(new window)