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A Study on Impurity Deposition using of ITO Substrate
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 Title & Authors
A Study on Impurity Deposition using of ITO Substrate
Park, Jung-Cheul; Chu, Soon-Nam;
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In this paper, we have studied a sheet resistance property of N- and P-type thin films deposited on ITO glass by use of RF magnetron sputtering. The N-type samples which has the deposition condition of 150W RF power, shows the highest current value, and the samples deposited for 15 minutes shows a better Ohmic contact property. As the substrate temperature, RF power and deposition time are increased, the sheet resistance of the samples is increased, and the low sheet resistance sample shows a better I-V property. The P-type samples shows the highest current value by 150W RF power condition as similar as N-type samples. and the samples deposited for 20 minutes shows a better ohmic contact property. The sheet resistance of the both types samples is increased as increasing RF power and deposition time.
ITO glass;RF power;RF magnetron sputtering;substrate temperature;ohmic contact;
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