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Properties of Nitrogen and Aluminum Codoped ZnO Thin Films Grown by Radio-frequency Magnetron Sputtering
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 Title & Authors
Properties of Nitrogen and Aluminum Codoped ZnO Thin Films Grown by Radio-frequency Magnetron Sputtering
Cho, Shin-Ho; Cho, Seon-Woog;
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 Abstract
Nitrogen and aluminum codoped ZnO(NAZO) thin films were grown on glass substrates with changing the nitrogen flow ratio by radio-frequency magnetron sputtering. The structural, optical, and electrical properties of the NAZO films were investigated. The surface morphologies and the structural properties of the thin films were analyzed by using the X-ray diffraction and scanning electron microscopy. The NAZO thin film, deposited at nitrogen flow ratio of 0%, showed a strongly c-axis preferred orientation and the lowest resistivity of . The intensity of ZnO(002) diffraction peak was decreased gradually with increasing the nitrogen flow ratio. The optical properties of the films were measured by UV-VIS spectrophotometer and the optical transmittances for all the samples were found to be an average 90% in the visible range. Based on the transmittance value, the optical bandgap energy for the NAZO thin film deposited at nitrogen flow ratio of 0% was determined to be 3.46 eV. As for the electrical properties, the carrier concentration and the hall mobility were decreased, but the electrical resistivity was increased as the nitrogen flow ratio was increased.
 Keywords
ZnO;RF magnetron sputtering;Nitrogen flow ratio;
 Language
Korean
 Cited by
1.
공정가스와 RF 주파수에 따른 웨이퍼 표면 텍스쳐 처리 공정에서 저반사율에 관한 연구,윤명수;현덕환;진법종;최종용;김정식;강형동;이준신;권기청;

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