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Characterization of a Remote Inductively Coupled Plasma System
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 Title & Authors
Characterization of a Remote Inductively Coupled Plasma System
Kim, Yeong-Uk; Yang, Won-Kyun; Joo, Jung-Hoon;
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 Abstract
We have developed a numerical model for a remote ICP(inductively coupled plasma) system in 2D and 3D with gas distribution configurations and confirmed it by plasma diagnostics. The ICP source has a Cu tube antenna wound along a quartz tube driven by a variable frequency rf power source( MHz) for fast tuning without resort to motor driven variable capacitors. We investigated what conditions should be met to make the plasma remotely localized within the quartz tube region without charged particles` diffusing down to a substrate which is 300 mm below the source, using the numerical model. OES(optical emission spectroscopy), Langmuir probe measurements, and thermocouple measurement were used to verify it. To maintain ion current density at the substrate less than 0.1 , two requirements were found to be necessary; higher gas pressure than 100 mTorr and smaller rf power than 1 kW for Ar.
 Keywords
Numerical modeling;Inductively coupled plasma;CFD-ACE;
 Language
Korean
 Cited by
1.
Numerical Modeling of an Inductively Coupled Plasma Based Remote Source for a Low Damage Etch Back System,;

Applied Science and Convergence Technology, 2014. vol.23. 4, pp.169-178 crossref(new window)
1.
Numerical Modeling of an Inductively Coupled Plasma Based Remote Source for a Low Damage Etch Back System, Applied Science and Convergence Technology, 2014, 23, 4, 169  crossref(new windwow)
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