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Characterization of a Magnetron Sputtering Cathode by a 3D Particle Model
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 Title & Authors
Characterization of a Magnetron Sputtering Cathode by a 3D Particle Model
Joo, Jung-Hoon;
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 Abstract
A 3D particle code is developed to analyze electron behavior in a planar magnetron sputtering cathode either in balanced or unbalanced configuration. Three types of collisions are included; electron - neutral elastic, excitation to a metastable state and ionization. Flight path is calculated by a 4-th order Runge-Kutta method with a time step of 10 ps. Effects of electron starting position, magnetic field intensity and configuration were analyzed. For a more efficient and accurate modeling, multithreading technique is considered for multicore CPU computers. Under an assumption of cold ion approach, target erosion profiles are predicted for a flat target surface.
 Keywords
plasma;magnetron sputtering;particle simulation;
 Language
Korean
 Cited by
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2.
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3.
Plasma Uniformity Analysis of Inductively Coupled Plasma Assisted Magnetron Sputtering by a 2D Voltage Probe Array,;

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1.
Plasma Uniformity Analysis of Inductively Coupled Plasma Assisted Magnetron Sputtering by a 2D Voltage Probe Array, Applied Science and Convergence Technology, 2014, 23, 4, 161  crossref(new windwow)
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