Advanced SearchSearch Tips
Surface Reaction of Na0.5K0.5NbO3 Thin Films in Inductively Coupled BCl3/Cl2/Ar Plasma
facebook(new window)  Pirnt(new window) E-mail(new window) Excel Download
 Title & Authors
Surface Reaction of Na0.5K0.5NbO3 Thin Films in Inductively Coupled BCl3/Cl2/Ar Plasma
Kim, Dong-Pyo; Um, Doo-Seung; Kim, Gwan-Ha; Woo, Jong-Chang; Kim, Chang-Il;
  PDF(new window)
The etch of (NKN) thin film was performed in inductively coupled plasma. It was found that the 1sccm addition (5%) into plasma caused a non-monotonic behavior of the NKN etch rate. The maximum etch rate of NKN was 95.3 nm/min at (1 sccm)/ (16 sccm)/Ar (4 sccm), 800 W ICP power, 1 Pa pressure and 400 W bias power. The NKN etch rate shows a monotonic behavior a s the bias power increases. The analysis of the narrow scan spectra of XPS for both a s-deposited and etched NKN films allowed one to assume ion assisted etch mechanism. The most probable reason for the maximum etch rate can be defined as a concurrence of chemical and physical etch pathways.
 Cited by
X. Wang, U. Helmersson, S. Olafsson, S. Rudner, L. Wernlund, S. Gevorgian, Appl. Phys. Lett. 73 (1998) 927 crossref(new window)

C.-R. Cho, J.-H. Koh, A. Grishin, S. Abadei, S. Gevorgian, Appl. Phys. Lett., 76 (2000) 1761 crossref(new window)

A. Shibuya, J. H Koh, A. Grishin, V. Kugler, D. Music, U. Helmersson, M. Okuyama, Mat. Res. Soc. Symp. Proc., 688 (2002) C7.7

C. R Cho, I. Katardjiev, M. Grishin, A. Grishin, Appl. Phy. Lett., 80 (2002) 3171 crossref(new window)

C. M. Kang, G. H. Kim, K. T. Kim, C. I. Kim, Ferroelectrics, 357 (2007) 179 crossref(new window)

S. J. Yun, A. Efremov, M. S. Kim, D. W. Kim, J. W. Lim, Y. H. Kim, C. H. Chung, D. J. Park, K. H. Kwon, 82 (2008) 1198

E. Meeks, P. Ho, A. Ting, R. J. Buss, J. Vac. Sci. Technol. A, 16 (1998) 2227 crossref(new window)

H. S. Kim, G. Y. Yeom, J. W. Lee, T. I. Kim, J. Vac. Sci. Technol. A, 17 (1999) 2214 crossref(new window)

M. S. Kim, N. K. Min, S. J. Yun, H. W. Lee, A. Efremov, K. H. Kwon, Microele. Eng., 84 (2008) 348

D. R. Lide, "Handbook of Chemistry and Physics", 79 CRC Press, 4-74, 1998

J. Chastain, "Handbook of X-ray Photoelectron Spectroscopy", Perkin Elmer, 1992