Heat Transfer Analysis of a Pulse Magnetron Sputtering Cathode

Title & Authors
Heat Transfer Analysis of a Pulse Magnetron Sputtering Cathode
Joo, Jung-Hoon;

Abstract
3-dimensional numerical analysis for a rectangular magnetron cathode model is done to predict cooling characteristics of high power sputtering system for ZnO deposition. It includes cooling channel design, heat transfer analysis of a target, bonding layer and backing plate. In order to model erosion profiles of a target, ion current density distribution from 3D Monte Carlo simulation is used to distribute total sputtering power to 5 discrete regions. At 3 kW of sputtering power and cooling water flow of 1 liter/min at $\small{10^{\circ}C}$, the maximum surface temperature was $\small{45.8^{\circ}C}$ for a flat new target and $\small{156^{\circ}C}$ for a target eroded by 1/3 of its thickness, respectively.
Keywords
Plasma;Magnetron sputtering;Heat transfer;Numerical analysis;
Language
Korean
Cited by
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