Publisher : The Korean Institute of Surface Engineering
DOI : 10.5695/JKISE.2010.43.2.091
Title & Authors
Ion Nitriding Using Pulsed D.C Glow Discharge Combined with Inductively Coupled Plasma Kim, Yoon-Kee;
SCM440 steels were nitrided using pulsed dc plasma combined with inductively coupled plasma (ICP) generated by 13.56 MHz rf power in order to enhance case hardening depth. The case hardening depth was increased with rf power. The effective case-depth with ICP at 900 watt was as 1.6 times as that nitrided without ICP. The hardening depth was also increased up to 1.45 times. The compound layers formed on top surface were dense and thin when pulsed dc plasma was combined with ICP.
Ion nitriding;Deep case hardening;ICP;Pulsed dc plasma;Nitrogen diffusion;