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Life Time Characteristics of OLED Device with AlOx Passivation Film Deposited by RF Magnetron Sputtering
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 Title & Authors
Life Time Characteristics of OLED Device with AlOx Passivation Film Deposited by RF Magnetron Sputtering
An, O-Jin; Ju, Sung-Hoo; Yang, Jae-Woong;
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 Abstract
We investigated the life time characteristics of OLED device with aluminium oxide () passivation film on glass substrate and polyethylene terephthalate (PET) substrate by RF magnetron sputtering for the transparent barrier film applied to flexible OLED device. Basic buffer layer was determined as (500 nm)-LiF(300 nm)-Al(1200 nm), and the most suitable aluminium oxide () film have been formed when the partial volume ratio of oxygen was 20% and the sputtering power was 100 watt and the minimum thickness of buffer was . /epoxy hybrid film was also used as a effective passivation layer for the purpose of improving life time characteristics of OLED devices with the glass substrate and the plastic substrate. Besides, the simultaneous deposition of /epoxy film on back side of PET could result in better improvement of life time.
 Keywords
OLED;Passivation;;Epoxy;Hybrid;PET;Sputtering;
 Language
Korean
 Cited by
1.
SiNx와 금속막을 이용한 플렉시블 OLED 봉지 방법,이효선;주성후;

한국표면공학회지, 2014. vol.47. 3, pp.99-103 crossref(new window)
1.
Encapsulation Method of Flexible OLED Using SiNxand Metal Film, Journal of the Korean institute of surface engineering, 2014, 47, 3, 99  crossref(new windwow)
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