Publisher : The Korean Institute of Surface Engineering
DOI : 10.5695/JKISE.2010.43.6.272
Title & Authors
Life Time Characteristics of OLED Device with AlOx Passivation Film Deposited by RF Magnetron Sputtering An, O-Jin; Ju, Sung-Hoo; Yang, Jae-Woong;
We investigated the life time characteristics of OLED device with aluminium oxide () passivation film on glass substrate and polyethylene terephthalate (PET) substrate by RF magnetron sputtering for the transparent barrier film applied to flexible OLED device. Basic buffer layer was determined as (500 nm)-LiF(300 nm)-Al(1200 nm), and the most suitable aluminium oxide () film have been formed when the partial volume ratio of oxygen was 20% and the sputtering power was 100 watt and the minimum thickness of buffer was . /epoxy hybrid film was also used as a effective passivation layer for the purpose of improving life time characteristics of OLED devices with the glass substrate and the plastic substrate. Besides, the simultaneous deposition of /epoxy film on back side of PET could result in better improvement of life time.