Advanced SearchSearch Tips
Characterization of Gas Distribution Effect in Inductively Coupled Plasma System
facebook(new window)  Pirnt(new window) E-mail(new window) Excel Download
 Title & Authors
Characterization of Gas Distribution Effect in Inductively Coupled Plasma System
Joo, Junghoon;
  PDF(new window)
We have developed a 2D axi-symmetric numerical model for an inductively coupled plasma system in order to analyze gas mixing effect through a narrow gap shower head. For frictional flow, holes of 0.5 mm diameter and 2 mm length are approximately modeled in 2D. Gas velocity distribution 10 mm below the shower head showed 2 times difference between the center and the edge at 10 mTorr. At 10 mm above the wafer, it was increased to 6 times difference due to the pumping duct effect. The model with a 5 mm height buffer region of a shower head showed reasonable behavior of Ar discharge. The density of Ar metastable showed additional peak inside the buffer region around the edge holes.
Numerical modeling;Inductively coupled plasma;CFD-ACE;
 Cited by
Efficiency Enhancement of PIC-MCC Modeling for Magnetron Sputtering Simulations Using GPU Parallelization, IEEE Transactions on Plasma Science, 2016, 44, 9, 1823  crossref(new windwow)
E. Meeks, P. Ho, Thin Solid Films, 365 (2000) 334. crossref(new window)

D. C. Kwon, N. S. Yoon, J. H. Hahn, J. W. Shon, Cur. Appl. Phys., 9 (2009) 546. crossref(new window)

W. G. Lee, D. C. Kwon, N .S. Yoon, J. Kor. Vac. Soc., 18 (2009) 426. crossref(new window)

D. Bose, T. R. Govindan, M. Meyyappan, J. Elec. Soc., 146 (1999) 2705. crossref(new window)

J. Joo, J. Kor. Vac. Sci., 18(3) (2009) 164.

E. Keiter, M. Kushner, IEEE Trans Plasma Sci., 27(2) (1999) 62. crossref(new window)

E. Meeks, R. S. Larson, P. Ho, Chris Apblett, S. Han, E. Edelberg, E. Adyl, J. Vac. Sci. A, 16 (1998) 544.