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Microfabrication of Photosensitive Glass Using Metal Patterning and Blank Exposure
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 Title & Authors
Microfabrication of Photosensitive Glass Using Metal Patterning and Blank Exposure
Jo, Jae-Seung; Kang, Hyung-Bum; Yoon, Hye-Jin; Kim, Hyo-Jin; Lim, Hyun-Woo; Cho, Si-Hyeong; Lim, Sil-Mook;
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The simple and cost-effective microfabrication method of photosensitive glass (PSG) using metal patterning and blank exposure was proposed. Conventional photolithography for micromachining of PSG needs a costly quartz mask which has high transmittance as an optical property. However, in this study the process was improved through the combination of micro-patterned Ti thin film and blank UV exposure without quartz mask. The effect of UV exposure time as well as the DHF etching condition was investigated. UV exposure test was performed within the range from 3 min to 9 min. The color and etch result of PSG exposed for 5 min were the most clear and effective to etch more precisely, respectively. The etching results of PSG in diluted hydrofluoric acid (DHF) with a concentration of 5, 10, 15 vol% were compared. The effect on the side etch was insignificant while the etch rate was proportional as the concentration increased. 10 vol% DHF results not only high etch rate of 75 also lower side etch value after PSG etching. This method facilitates the microfabrication of PSG with various patterns and high aspect ratio for applying to advanced applications.
Photosensitive glass (PSG);Blank exposure;Microfabrication;Glass etching;
 Cited by
용액 미립화공정 기반의 마이크로 스텐실 프린팅에 관한 연구,당현우;김형찬;고정범;양영진;양봉수;최경현;도양회;

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