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Characteristics of NbN Films Deposited on AISI 304 Using Inductively Coupled Plasma Assisted DC Magnetron Sputtering Method
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 Title & Authors
Characteristics of NbN Films Deposited on AISI 304 Using Inductively Coupled Plasma Assisted DC Magnetron Sputtering Method
Jun, Shinhee; Kim, Junho; Kim, Sunkwang; You, Yong Zoo; Cha, Byungchul;
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 Abstract
Niobium nitride (NbN) films were deposited on AISI 304 stainless steels by inductively coupled plasma (ICP) assisted dc magnetron sputtering method at different ICP powers, and the effects of ICP power on the phase formation, mechanical and chemical properties of the films were investigated. X-ray diffraction analysis (XRD) and field emission scanning electron microscopy (FESEM) were used to analyze the crystal structure and micro-knoop hardness was used to measure the hardness of the films. Also, 3-D mechanical profiler and a ball-on-disk wear tester were used to measure the thickness of the films and to estimate wear characteristics, respectively. The thickness of the films decreased but their hardness increased with increasing ICP power, and it was confirmed that only cubic -NbN(200) remained at high ICP power. At lower ICP powers, a mixture of the hexagonal -NbN and cubic -NbN phases was obtained in the films and the hardness decreased. The corrosion potential value increased gradually with increasing ICP power, but the changes of ICP power did not significantly influence the overall corrosion resistance.
 Keywords
NbN thin films;Inductively coupled plasma (ICP);Reactive magnetron sputtering;
 Language
English
 Cited by
1.
Plasma Uniformity Analysis of Inductively Coupled Plasma Assisted Magnetron Sputtering by a 2D Voltage Probe Array,;

Applied Science and Convergence Technology, 2014. vol.23. 4, pp.161-168 crossref(new window)
2.
DC 스퍼터법과 비대칭 바이폴라 펄스 DC 스퍼터법으로 증착된 NbN 코팅막의 물성 비교연구,전성용;오복현;

한국표면공학회지, 2015. vol.48. 4, pp.136-141 crossref(new window)
1.
A Comparative Study of NbN Coatings Deposited by DC and Pulsed DC Asymmetric Bipolar Magnetron Sputtering, Journal of the Korean institute of surface engineering, 2015, 48, 4, 136  crossref(new windwow)
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Plasma Uniformity Analysis of Inductively Coupled Plasma Assisted Magnetron Sputtering by a 2D Voltage Probe Array, Applied Science and Convergence Technology, 2014, 23, 4, 161  crossref(new windwow)
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