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I-V Characteristics of Negatively DC Pulsed Target in ECR Plasma for Landmine Detection
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 Title & Authors
I-V Characteristics of Negatively DC Pulsed Target in ECR Plasma for Landmine Detection
Kim, Seong Bong; Lee, Hui Jea; Park, Seungil; Yoo, Suk Jae; Cho, Moohyun; Han, Seung-Hoon; Lim, Byeongok;
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 Abstract
I-V characteristics of a cylindrical target in an ECR plasma were studied for sheath spatial evolutions when the target was pulsed biased to a high negative potential. The magnetic field effects on sheath thickness and sheath boundary speed were investigated by comparison between the experimental results and the theoretical results using the Child-Langmuir sheath model. The results showed that the magnetic field suppressed electron motion away from the target so that sheath thickness and sheath boundary speed decreased.
 Keywords
ECR plasma;High voltage pulse;
 Language
Korean
 Cited by
1.
Bipolar Pulse Bias Effects on the Properties of MgO Reactively Deposited by Inductively Coupled Plasma-Assisted Magnetron Sputtering,;

Applied Science and Convergence Technology, 2014. vol.23. 3, pp.145-150 crossref(new window)
1.
Bipolar Pulse Bias Effects on the Properties of MgO Reactively Deposited by Inductively Coupled Plasma-Assisted Magnetron Sputtering, Applied Science and Convergence Technology, 2014, 23, 3, 145  crossref(new windwow)
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