Publisher : The Korean Institute of Surface Engineering
DOI : 10.5695/JKISE.2014.47.2.081
Title & Authors
Influence of Post-deposition Annealing Temperature on the Properties of GZO/Al Thin Film Kim, Sun-Kyung; Kim, Seung-Hong; Kim, So-Young; Jeon, Jae-Hyun; Gong, Tae-Kyung; Yoon, DaeYoung; Choi, DongYong; Choi, Dong-Hyuk; Son, Dong-Il; Kim, Daeil;
Ga doped ZnO (GZO)/Al bi-layered films were deposited on the glass substrate by RF and DC magnetron sputtering and then vacuum annealed at different temperatures of 100, 200 and for 30 minutes to consider the effects of annealing temperature on the structural, electrical and optical properties of the films. For all depositions, the thicknesses of the GZO and Al films were kept constant at 95 and 5 nm, respectively, by controlling the deposition time. As-deposited GZO/Al bi-layered films showed a relatively low optical transmittance of 62%, while the films annealed at showed a higher transmittance of 81%, compared to the other films. In addition, the electrical resistivity of the films was influenced by annealing temperature and the lowest resistivity of was observed in the films annealed at . Due to the increased carrier mobility, 2.35 of the films. From the experimental results, it can be concluded that increasing the annealing temperature enhanced the optical and electrical properties of the GZO/Al films.