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A Comparative Study of TiAlN Coatings Deposited by DC and Pulsed DC Asymmetric Bipolar Magnetron Sputtering
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 Title & Authors
A Comparative Study of TiAlN Coatings Deposited by DC and Pulsed DC Asymmetric Bipolar Magnetron Sputtering
Chun, Sung-Yong; Lee, Tae Yang;
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 Abstract
The paper presents the comparative results of TiAlN coatings deposited by DC and pulsed DC asymmetric bipolar magnetron sputtering systems. The results show that, with the decreasing duty cycle and increasing pulse frequency, the coating morphology changes from a columnar to a dense structure, with finer grains. Pulsed sputtered TiAlN coatings showed higher hardness, higher residual stress, and smaller grain sizes than dc prepared TiAlN coatings. Moreover residual stress of pulsed sputtered TiAlN coatings increased on increasing pulse frequency. Meanwhile, the surface roughness decreased continuously with increasing pulsed DC frequency up to 50 kHz.
 Keywords
Pulsed DC Sputtering;TiAlN;Asymmetric Bipolar;Duty cycle;Pulse frequency;
 Language
Korean
 Cited by
1.
DC 스퍼터법과 비대칭 바이폴라 펄스 DC 스퍼터법으로 증착된 NbN 코팅막의 물성 비교연구,전성용;오복현;

한국표면공학회지, 2015. vol.48. 4, pp.136-141 crossref(new window)
1.
A Comparative Study of NbN Coatings Deposited by DC and Pulsed DC Asymmetric Bipolar Magnetron Sputtering, Journal of the Korean institute of surface engineering, 2015, 48, 4, 136  crossref(new windwow)
2.
Effect of Inductively Coupled Plasma on the Microstructure, Structure and Mechanical Properties of VN Coatings, Journal of the Korean institute of surface engineering, 2016, 49, 4, 376  crossref(new windwow)
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