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Chemical Vapor Deposition of Inorganic Thin Films using Atmospheric Plasma : A Review of Research Trend
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 Title & Authors
Chemical Vapor Deposition of Inorganic Thin Films using Atmospheric Plasma : A Review of Research Trend
Kim, Kyong Nam; Lee, Seung Min; Yeom, Geun Young;
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 Abstract
In recent years, the cleaning and activation technology of surfaces using atmospheric plasma as well as the deposition technology for coating using atmospheric plasma have been demonstrated conclusively and drawn increasing industrial attention. Especially, due to the simplicity, the technology using atmospheric plasma enhanced chemical vapor deposition has been widely studied from many researchers. The plasma source type commonly used as the stabilization of diffuse glow discharges for atmospheric pressure plasma enhanced chemical vapor deposition pressure is the dielectric barrier discharge. In this review paper, some kinds of modified dielectric barrier discharge type will be presented. And, the characteristics of silicon based compound such as SiOx and SiNx deposited using atmospheric plasma enhanced chemical vapor system will be discussed.
 Keywords
atmospheric plasma;deposition;precursor;SiOx;SiNx;
 Language
Korean
 Cited by
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