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Study on Electron Temperature Diagnostic and the ITO Thin Film Characteristics of the Plasma Emission Intensity by the Oxygen Gas Flow
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 Title & Authors
Study on Electron Temperature Diagnostic and the ITO Thin Film Characteristics of the Plasma Emission Intensity by the Oxygen Gas Flow
Park, Hye Jin; Choi, Jin-Woo; Jo, Tae Hoon; Yun, Myoung Soo; Kwon, Gi-Chung;
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The plasma has been used in various industrial fields of semiconductors, displays, transparent electrode and so on. Plasma diagnostics is critical to the uniform process and the product. We use the electron temperature of the various plasma parameters for the diagnosis of plasma. Generally, the range of the electron temperature which is used in a semiconductor process used the range of 1 eV to 10 eV. The difference of electron temperature of 0.5 eV has a influence in plasma process. The electron temperature can be measured by the electrical method and the optical method. Measurement of electron temperature for various gas flow rates was performed in DC-magnetron sputter and Inductively Coupled Plasma. The physical properties of the thin film were also determined by changing electron temperatures. The transmittance was measured using the integrating sphere, and wavelength range was measured at 300 ~ 1100 nm. We obtain the thin film of the mobility, resistivity and carrier concentration using the hall measurement system. As to the electron temperature increase, optical and electrical properties decrease. We determine it was influenced by the oxygen flow ratio and plasma.
DC-magnetron sputtering;Inductively Coupled Plasma;Double Langmuir Probe;Line ratio method;Electron temperature;
 Cited by
I. Hamberg and C. G. Granqvist, Evaporated Sn-doped In2O3 films: Basic optical properties and applications to energy-efficient windows, J. Appl. Phys, 61(1986), R123-R160

K. L. Chopla, S. Major, and D. K. Pandya, Transparent conductors-A status review, Thin Solid Films, 102(1983), 1-46 crossref(new window)

I. Langmuir, Positive Ion Currents in the Positive Colunm of the Mercury Arc, Gen. Electr. Rev. 26(1923), 731-735

W. H. Hood, T. M. Niemczyk, Excitation Temperatures in the Microwave-Induced Active-Nitrogen Afterglow, Appl. Spectro. 41(1987), 674-678 crossref(new window)

John B. Boffard, Chun C. Lin, Charles A. Dejosephg Jr, Application of excitation cross sections to optical plasma diagnostics, J. Phys. D, 37(2004), R143-R161. crossref(new window)

R. F. Boivin, J. L. Kline, E. E. Scime, Electron temperature measurement by a helium line intensity ratio method in hel icon plasmas, Physics of Plasma, 8(2001), 5303(12pp) crossref(new window)

T. H. Chung, Hae Ra Kang, Min Keun Bae, Optical emission diagnostics with electric probe measurements of inductively coupled Ar/O2/Ar-O2 plasmas, Physics of Plasma, 19(2012), 113502-1-113501-10 crossref(new window)

Andre M. Daltrini, Stanislav A. Moshkalev, Laura Swart, Patrick B. Verdonck, Plasma Parameters Obtained with Plasnar Probe and Optical Emission Spectroscopy, Journal Interated Circuits and Systems, 2(2007), 67-73.

Namjun Kang, Soo-ghee Oh, Andre Ricard, Determination of the electron temperature in a planar inductive argon plasma with emission spectroscopy and electrostatic probe, J. Phys. D 41(2008) 155203(6pp). crossref(new window)

P. Jamroz, W. Zyrnicki, The spectroscopic study of a glow discharge generated between pin electrode and water in open air atmosphere ISPC, 19(2009), 474(4pp)

Dong Hae Kim, Chan Hee Son, Myung Soo Yun, Kyung Ae Lee, Tae Hoon Jo, Il-Won Seo, Han Sup Uhm, In Tae Kim, Guang Sup Cho, Gi Chung Kwon, Proberties of Indium Tin Oxide Thin Films According to Oxygen Flow Rates by $\gamma$-FIB System, Jounal of the Korea Vaccum Society, 21(2012), 333-341. crossref(new window)

Li-Jian Meng, Jinsong Gao, R. A Silva, Shigeng Song, Effect of the oxygen flow on the properties of ITO thin films deposition by ion beam assisted deposition(IBAD), Thin Solid Film,s 516(2008), 5454-5459 crossref(new window)

Dong H. Choi, Min J. Keum, A R. Jeon, Jeon G. Han, A Study on the Electrical Properties of ITO Thin Films with Various Oxygen Gas Flow Rate, J. Kor. Inst. Surf. Eng, 40(2007), 144-148 crossref(new window)