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Properties of AlTiN Films Deposited by Cathodic Arc Deposition
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 Title & Authors
Properties of AlTiN Films Deposited by Cathodic Arc Deposition
Yang, Ji-Hoon; Kim, Sung-Hwan; Song, Min-A; Jung, Jae-Hun; Jeong, Jae-In;
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The properties of AlTiN films by a cathodic arc deposition process have been studied. Oblique angle deposition has been applied to deposit AlTiN films. AlTiN films have been deposited on stainless steel (SUS304) and cemented carbide (WC) at a substrate temperature of . AlTiN films were analyzed by scanning electron microscopy, glow-discharge light spectroscopy, micro-vickers hardness, and nanoindenter. When applying a current of 50 A to the cathodic arc source, it showed that the density of macroparticle of AlTiN films was 5 lower than other deposition conditions. With the increase of the bias voltage applied to the substrate up to -150 V, the density of macroparticle was decreased. The change of the flow rate during coating process made no influence on the film properties. For the multi-layered films, the film prepared at oblique angle of showed the highest hardness of 28 GPa and index of 0.18. AlTiN films have been shown a good oxidation resistance up to .
AlTiN films;Cathodic arc deposition;Oblique angle deposition;Physical vapor deposition;Macroparticle;
 Cited by
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