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Review of Hazardous Agent Level in Wafer Fabrication Operation Focusing on Exposure to Chemicals and Radiation
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 Title & Authors
Review of Hazardous Agent Level in Wafer Fabrication Operation Focusing on Exposure to Chemicals and Radiation
Park, Donguk;
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 Abstract
Objectives: The aim of this study is to review the results of exposure to chemicals and to extremely low frequency(ELF) magnetic fields generated in wafer fabrication operations in the semiconductor industry. Methods: Exposure assessment studies of silicon wafer fab operations in the semiconductor industry were collected through an extensive literature review of articles reported until the end of 2015. The key words used in the literature search were "semiconductor industry", "wafer fab", "silicon wafer", and "clean room," both singly and in combination. Literature reporting on airborne chemicals and extremely low frequency(ELF) magnetic fields were collected and reviewed. Results and Conclusions: Major airborne hazardous agents assessed were several organic solvents and ethylene glycol ethers from Photolithography, arsenic from ion implantation and extremely low frequency magnetic fields from the overall fabrication processes. Most exposures to chemicals reported were found to be far below permissible exposure limits(PEL) (10% < PEL). Most of these results were from operators who handled processes in a well-controlled environment. In conclusion, we found a lack of results on exposure to hazardous agents, including chemicals and radiation, which are insufficient for use in the estimation of past exposure. The results we reviewed should be applied with great caution to associate chronic health effects.
 Keywords
ELF;retrospective exposure;wafer fabrication operation;
 Language
Korean
 Cited by
1.
일부 반도체 사업장 포토레지스트 화학물질 MSDS 정보의 신뢰성 분석,이경화;이석용;최윤지;최한영;

한국산업보건학회지, 2016. vol.26. 4, pp.404-410 crossref(new window)
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The relationship between spontaneous abortion and female workers in the semiconductor industry, Annals of Occupational and Environmental Medicine, 2017, 29, 1  crossref(new windwow)
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