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Review of Hazardous Agent Level in Wafer Fabrication Operation Focusing on Exposure to Chemicals and Radiation
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 Title & Authors
Review of Hazardous Agent Level in Wafer Fabrication Operation Focusing on Exposure to Chemicals and Radiation
Park, Donguk;
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Objectives: The aim of this study is to review the results of exposure to chemicals and to extremely low frequency(ELF) magnetic fields generated in wafer fabrication operations in the semiconductor industry. Methods: Exposure assessment studies of silicon wafer fab operations in the semiconductor industry were collected through an extensive literature review of articles reported until the end of 2015. The key words used in the literature search were "semiconductor industry", "wafer fab", "silicon wafer", and "clean room," both singly and in combination. Literature reporting on airborne chemicals and extremely low frequency(ELF) magnetic fields were collected and reviewed. Results and Conclusions: Major airborne hazardous agents assessed were several organic solvents and ethylene glycol ethers from Photolithography, arsenic from ion implantation and extremely low frequency magnetic fields from the overall fabrication processes. Most exposures to chemicals reported were found to be far below permissible exposure limits(PEL) (10% < PEL). Most of these results were from operators who handled processes in a well-controlled environment. In conclusion, we found a lack of results on exposure to hazardous agents, including chemicals and radiation, which are insufficient for use in the estimation of past exposure. The results we reviewed should be applied with great caution to associate chronic health effects.
ELF;retrospective exposure;wafer fabrication operation;
 Cited by
일부 반도체 사업장 포토레지스트 화학물질 MSDS 정보의 신뢰성 분석,이경화;이석용;최윤지;최한영;

한국산업보건학회지, 2016. vol.26. 4, pp.404-410 crossref(new window)
The relationship between spontaneous abortion and female workers in the semiconductor industry, Annals of Occupational and Environmental Medicine, 2017, 29, 1  crossref(new windwow)
Abdollahzadeh S, Katharine SH, Schenker MB. A model for assessing occupational exposure to extremely low-frequency magnetic fields in fabrication rooms in the semiconductor health study. Am J Ind Med 1995;28:723-734

Baldwin D, King B, Scarpace L. Ion Implanters-Chemical and radiation safety. Solid State Technol 1988;31: 99-105 crossref(new window)

Bender TJ, Beall C, Cheng H, Herrick RF, Kahn AR, et al. Cancer incidence among semiconductor and electronic storage device workers. Occup Environ Med 2007;64:30-36 crossref(new window)

Boice JD, Marano DE, Munro HM, Chadda BK, Signorello LB, et al. Cancer Mortality Among US Workers Employed in Semiconductor Wafer Fabrication. J Occup Environ Med 2010;52:1082-1097 crossref(new window)

Bowman JD, Touchstone JA, Yost MG. A populationbased job exposure matrix for power-frequency magnetic fields. J Occup Environ Hyg. 2007;4: 715-728 crossref(new window)

Chung EK, Kim KB, Chung KJ, Lee IS, You KH, Park JS. Occupational exposure of semiconductor workers to ELF magnetic fields. J Korean Soc Occup Environ Hyg 2012;22:42-51

Clapp DE, Zaebst DD, Herrick RF. Measuring exposures to glycol ethers. Environ Health Perspect 1984;57:91 crossref(new window)

Correa A, Gray RH, Cohen R, Rothman N, Shah F, et al. Ethylene glycol ethers and risks of spontaneous abortion and subfertility. Am J Epidemiol 1996;143: 707-717 crossref(new window)

Crawford W, Green D, Knolle W, Marcos H, Mosovsky J, et al. Magnetic field exposure in semiconductor cleanrooms. Hazard Assessment and Control Technology in Semiconductor Manufacturing II. 1993

Hallock MF, Hammond SK, Kenyon E, Smith TJ, Smith ER. Assessment of task and peak exposures to solvents in the microelectronics fabrication industry. Appl Occup Environ Hyg 1993;8:945-954 crossref(new window)

Hammond S, Hines C, Hallock M, Woskie S, Kenyon E, Schenker M. Exposures to glycol ethers in the semiconductor industry. Occup Hyg 1996;2

Harrison M. Semiconductor manufacturing hazards. Williams & Wilkins, Hazardous Materials Toxicology: Clinical Principles of Environmental Health(USA) 1992;472-504

Herrick RF, Stewart JH, Blicharz D, Beall C, Bender T, et al. Exposure assessment for retrospective follow-up studies of semiconductor-and storage devicemanufacturing workers. J Occup Environ Med 2005; 47:983-995 crossref(new window)

Hsieh GY, Wang JD, Cheng TJ, Chen PC. Prolonged menstrual cycles in female workers exposed to ethylene glycol ethers in the semiconductor manufacturing industry. Occup Environ Med 2005;62:510-516 crossref(new window)

ICNRP(International Commission on Non-Ionizing Radiation Pretection). Guidelines for limiting exposure to time-varying electric and magnetic fields (1 Hz to 100 kHz). Health Phys. 2010;99:818-836

Jones JH. Exposure and control assessment of semiconductor manufacturing. Photolithographyvoltaic Safety 1988: AIP Publishing

LaDou J. Occupational health in the semiconductor industry. Abstracts of Papers of the American Chemical Society 2000, Washington DC, USA

Lee HE, Kim EA, Park J, Kang SK. Cancer mortality and incidence in Korean semiconductor workers. Saf Health Work 2011;2:135-147 crossref(new window)

Marano DE, Boice Jr JD, Munro HM, Chadda BK, Williams ME, et al. Exposure assessment among US workers employed in semiconductor wafer fabrication. J Occup Environ Med 2010;52:1075-1081 crossref(new window)

McElvenny DM, Darnton AJ, Hodgson JT, Clarke SD, Elliott RC, Osman J. Investigation of cancer incidence and mortality at a Scottish semiconductor manufacturing facility. Occup Med 2003;53:419-430 crossref(new window)

Park DU, Yang HS, Jeong JY, Ha KC, Choi SJ, et al. A comprehensive review of arsenic levels in the semiconductor manufacturing industry. Ann Occup Hyg 2010;54:869-879 crossref(new window)

Park DU, Byun HJ, Choi SJ, Jeong JY, Yoon CS, et al. Review on potential risk factors in wafer fabrication process of semiconductor industry. Korean J Occup Environ Med 2011a;23:333-342

Park HH, Jang JK, Shin JA. Quantitative exposure assessment of various chemical substances in a wafer fabrication industry facility. Saf Health Work 2011b; 2:39-51 crossref(new window)

Rosenthal FS, Abdollahzadeh S. Assessment of extremely low frequency (ELF) electric and magnetic fields in microelectronics fabrication rooms. Appl Occup Environ Hyg 1991;6:777-784 crossref(new window)

Smith T, Sonnenfeld DA, Pellow DN. Challenging the chip: Labor rights and environmental justice in the global electronics industry: Temple University Press; 2006

Sorahan T, Pope DJ, Mckiernan MJ. Cancer Incidence and Cancer Mortality in a Cohort of Semiconductor Workers - an Update. Br J Ind Med 1992;49:215-216

Sorahan T, Waterhouse JAH, Mckiernan MJ, Aston RHR. Cancer Incidence and Cancer Mortality in a Cohort of Semiconductor Workers. Br J Ind Med 1985;42: 546-550

Wald PH, Jones JR. Semiconductor Manufacturing - an Introduction to Processes and Hazards. Am J Ind Med 1987;11:203-221 crossref(new window)

Watterson A, Ladou J. Health and safety executive inspection of UK semiconductor manufacturers. Int J Occup Environ Health 2003;9:392-396 crossref(new window)

Woskie SR, Hammond SK, Hines CJ, Hallock MF, Kenyon E, et al. Personal fluoride and solvent exposures, and their determinants, in semiconductor manufacturing. Appl Occup Environ Hyg 2000;15:354-361 crossref(new window)

Zellers ET, Ke H, Smigiel D, Sulewski R, Patrash SJ, et al. Glove permeation by semiconductor processing mixtures containing glycol-ether derivatives. Am Ind Hyg Assoc J 1992;53:105-116 crossref(new window)