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Residual Stress and Elastic Modulus of Y2O3 Coating Deposited by EB-PVD and its Effects on Surface Crack Formation
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 Title & Authors
Residual Stress and Elastic Modulus of Y2O3 Coating Deposited by EB-PVD and its Effects on Surface Crack Formation
Kim, Dae-Min; Han, Yoon-Soo; Kim, Seongwon; Oh, Yoon-Suk; Lim, Dae-Soon; Kim, Hyung-Tae; Lee, Sung-Min;
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 Abstract
Recently, a new coating deposited using the EB-PVD method has been developed for erosion resistant applications in fluorocarbon plasma environments. In this study, surface crack formation in the coating has been analyzed in terms of residual stress and elastic modulus. The coating, deposited on silicon substrate at temperatures higher than , showed itself to be sound, without surface cracks. When the residual stress of the coating was measured using the Stoney formula, it was found to be considerably lower than the value calculated using the elastic modulus and thermal expansion coefficient of bulk . In addition, amorphous and crystalline coatings were similarly prepared and their residual stresses were compared to the calculated values. From nano-indentation measurement, the elastic modulus of the coating in the direction parallel to the coating surface was found to be lower than that in the normal direction. The lower modulus in the parallel direction was confirmed independently using the load-deflection curves of a micro-cantilever made of coating and from the average residual stress-temperature curve of the coated sample. The elastic modulus in these experiments was around 33 ~ 35 GPa, which is much lower than that of a sintered bulk sample. Thus, this low elastic modulus, which may come from the columnar feather-like structure of the coating, contributed to decreasing the average residual tensile stress. Finally, in terms of toughness and thermal cycling stability, the implications of the lowered elastic modulus are discussed.
 Keywords
Yttrium oxide;Residual stress;Elastic modulus;Nano indentation;
 Language
English
 Cited by
 References
1.
M. Schaepkens, R. C. M. Bosch, T. E. F. M. Standaert, G. S. Oehrlein, and J. M. Cook, "Influence of Reactor Wall Conditions on Etch Processes in Inductively Coupled Fluorocarbon Plasmas," J. Vac. Sci. Technol. A, 16 [4] 2099-107 (1998).

2.
N. Ito, T. Moriya, F. Uesugi, M. Matsumoto, S. Liu, and Y. Kitayama, "Reduction of Particle Contamination in Plasma-Etching Equipment by Dehydration of Chamber Wall," Jpn. J. Appl. Phys., 47 [5] 3630-34 (2008). crossref(new window)

3.
D. M. Kim, K. B. Kim, S. Y. Yoon, Y. S. Oh, H. T. Kim, and S. M. Lee, "Effects of Artificial Pores and Purity on the Erosion Behaviors of Polycrystalline $Al_2O_3$ Ceramics under Fluorine Plasma," J. Ceram. Soc. Jpn., 117 [8] 863-67 (2009). crossref(new window)

4.
J. Iwasawa, R. Nishimizu, M. Tokita, M. Kiyohara, and K. Uematsu, "Plasma Resistance Dense Yttrium Oxide Film Prepared by Aerosol Deposition Process," J. Am. Ceram. Soc., 90 [8] 2327-32 (2007). crossref(new window)

5.
H. Choi, K. Kim, H. Choi, S. Kang, J. Yun, Y. Shin, and T. Kim, "Plasma Resistant Aluminum Oxide Coatings for Semiconductor Processing Apparatus by Atmospheric Aerosol Spray Method," Surf. Coat. Technol., 205 s125-28 (2010). crossref(new window)

6.
K. B. Kim, D. M. Kim, J. K. Lee, Y. S. Oh, H. T. Kim, H. S. Kim, and S. M. Lee, "Erosion Behavior of YAG Ceramics under Fluorine Plasma and their XPS Analysis (in Korean)," J. Korean Ceram. Soc., 46 [5] 456-61 (2009). crossref(new window)

7.
D. M. Kim, S. H. Lee, W. B. Alexander, K. B. Kim, Y. S. Oh, and S. M. Lee, "X-ray Photoelectron Spectroscopy Study on the Interaction of Yttrium-Aluminum Oxide with Fluorinebased Plasma," J. Am. Ceram. Soc., 94 [10] 3455-59 (2011). crossref(new window)

8.
D. M. Kim, Y. S. Oh, S. Kim, H. T. Kim, D. S. Lim, and S. M. Lee, "The Erosion Behaviors of $Y_2O_3$ and $YF_3$ Coatings under Fluorocarbon Plasma," Thin Solid Films, 519 [20] 6698-702 (2011). crossref(new window)

9.
A. J. V. Roosmalen, J. A. G. Baggerman, S. J. H. Brader, Dry Etching for VLSI, pp. 39, Plenum Press, New York, 1991.

10.
Y. Kobayashi, Current Status and Needs in the Future of Ceramics Used for Semiconductor Production Equipment (in Japanese), pp. 17, Osaka, Japan, July, 2005, the 37th Seminar on High-Temperature, Ceramics Society of Japan, 2005.

11.
M. Ohring, Materials Science of Thin Films, pp. 732, Academic Press, San-Diego, 2002.

12.
G. G. Stoney, "The Tension of Metallic Films Deposited by Electrolysis," Proc. R. Soc. London, Ser. A, 82 [553] 172-75 (1909). crossref(new window)

13.
B. A. Movchan and A. V. Demchishin, "Study on the Structure and Properties of Thick Vacuum Condensates of Nickel, Titanium, Tungsten, Aluminum Oxide and Zirconium Dioxide," Fiz. Met. Metall., 28 [4] 653-60 (1969).

14.
J. A. Thornton, "Influence of Apparatus Geometry and Deposition Conditions on the Structure and Topography of Thick Sputtered Coatings," J. Vac. Sci. Technol., 11 [4] 666-70 (1974). crossref(new window)

15.
W. R. Manning and O. Hunter, Jr, "Elastic Properties of Polycrystalline Yttrium Oxide, Dysprosium Oxide, Holmium Oxide, and Erbium Oxide: Room Temperature Measurements," J. Am. Ceram. Soc., 52 [8] 436442 (1969).

16.
L. B. Freund, S. Suresh, Thin Film Materials, pp. 283, Cambridge University Press, Cambridge, 2003.

17.
A. A. Kaminskii, M. Sh. Akchurin, R. V. Gainutdinov, K. Takaichi, A. Shirakava, H. Yagi, T. Yanagitani, and K. Ueda, " Microhardness and Fracture Toughness of $Y_2O_3$ -and $Y_3Al_5O_{12}$- Based Nanocrystalline Laser Ceramicsm," Crystallogr. Rep., 50 [5] 869-73 (2005). crossref(new window)

18.
D. H. Riu, S. W. Lee, Y. K. Jeong, and S. C. Choi, "Sintering of Synthetic Hydroxyapatite Compacts," Key Eng. Mater., 264-268 2087-90 (2004). crossref(new window)

19.
D. R. Clarke and C. G. Levi, "Materials Design for the Next Generation Thermal Barrier Coatings," Annu. Rev. Mater. Res., 33 383-417 (2003). crossref(new window)

20.
U. Schulz, C. Leyens, K. Fritscher, M. Peters, B. Saruhan-Brings, O. Lavigne, J. M. Dorvaux, M. Poulain, R. Mevrel, and M. Caliez, "Some Recent Trends in Research and Technology of Advanced Thermal Barrier Coatings," Aerosp. Sci. Technol., 7 [1] 73-80 (2003). crossref(new window)

21.
C. G. Levi, "Emerging Materials and Processes for Thermal Barrier Systems," Curr. Opinion in Solid state Mater. Sci., 8 77-91 (2004). crossref(new window)

22.
B. K. Jang and H. Matsubara, "Influence of Porosity on Hardness and Young's Modulus of Nanoporous EB- PVD TBCs by Nanoindentation," Mater. Lett., 59 3462-66 (2005). crossref(new window)