Development of intregrated process control system for plasma etching utilizing neural network and genetic algorithm

  • Koh, Taek-Beom (Dept. of Elec. Eng., Yonsei Univ., Seodaemun Ku (Tel:+82-2-361-2767)) ;
  • Cha, Sang-Yeob (Dept. of Elec. Eng., Yonsei Univ., Seodaemun Ku (Tel:+82-2-361-2767)) ;
  • Woo, Kwang-Bang (Dept. of Elec. Eng., Yonsei Univ., Seodaemun Ku (Tel:+82-2-361-2767)) ;
  • Moon, Dae-Sik (Manufact. Eng. Team, Kiheung Plant, Memory Devices Business, Samsung Electronics Co., Ltd) ;
  • Kwak, Kyu-Hwao (Manufact. Eng. Team, Kiheung Plant, Memory Devices Business, Samsung Electronics Co., Ltd) ;
  • Chang, Ho-Seung (Manufact. Eng. Team, Kiheung Plant, Memory Devices Business, Samsung Electronics Co., Ltd)
  • Published : 1995.10.01

Abstract

The purpose of this study is to provide the integrated process control system, utilizing neural network modeling, to search for the appropriate choice input, and to keep the process output within the desired rang in the real etch process.