Polymer Photonic Crystals Using Laser Holography Lithography

레이저 홀로그래피법을 이용한 폴리머 광결정의 패턴형성 기술

  • 장원석 (한국기계연구원 나노공정그룹) ;
  • 문준혁 (한국과학기술원 생명화학공학과) ;
  • 양승만 (한국과학기술원 생명화학공학과)
  • Published : 2004.10.01

Abstract

We have demonstrated the fabrication of patterned 3D photonic crystals by holographic lithography in conjunction with soft lithography. Holographic lithography created 3D ordered macroporous structures and soft lithography made tailored defects. Because the hard baked photoresist pattern possessed high resistance against the uncured photoresist solution and the refractive index did not change appreciably by hard baking, a crosslinked photoresist was used as a relief pattern for the holographic fabrication of patterned 3D photonic crystals. More complicated defect geometries might be easily obtained with more complicated patterns on PDMS stamps. Moreover, the present results might be used as templates for 3D PCs of highindex defects that can be exploited as optical waveguides and optical circuits.