Photolithography Process of Organic Thin Film with A New Water Soluble Photoresist
- Kim, Kwang-Hyun (TFT-LCD National Lab. & Dong-A Univ., Div. of Electrical & Electronics & Computer Eng.) ;
- Song, Chung-Kun (TFT-LCD National Lab. & Dong-A Univ., Div. of Electrical & Electronics & Computer Eng.)
- Published : 2004.08.23
We developed a new photoresist which was composed of polyaniline, uv-curing agent, N-methyl-2- pyrrolidine (NMP) and N-Butyl alcohol (BuOH) as solution. The photoresist is characterized by the capability of being developed in water. We successfully patterned pentacene thin film, which was vulnerable to organic solvent and thus could not be patterned by the conventional photolithography process, with the water soluble photoresist and the minimum feature size was found to be 2um.