Synthesis of Imide Monomers for Application to Organic Photosensitive Interdielectric Layer

  • Kwon, Hyeok-Yong (Department of Sensor & Display, Kyungpook National University) ;
  • Vu, Quang Hung (Department of Polymer Science, Kyungpook National University) ;
  • Lee, Yun-Soo (Advanced Display Manufacturing Research Center, Kyungpook National University) ;
  • Park, Lee-Soon (Department of Polymer Science, Kyungpook National University)
  • Published : 2008.10.13

Abstract

A negative photoresist formulation was developed utilizing synthesized UV monomers containing imide linkage, photoinitiator, UV oligomer, and alkali developable polymer matrix. It was found that via-holes with good resolution, high transmittance and thermal resistance could be obtained by photolithographic process utilizing the negative-type photoresist formulations.

Acknowledgement

Supported by : Ministry of Commerce, Industry and Energy