Synthesis of Imide Monomers for Application to Organic Photosensitive Interdielectric Layer
- Kwon, Hyeok-Yong (Department of Sensor & Display, Kyungpook National University) ;
- Vu, Quang Hung (Department of Polymer Science, Kyungpook National University) ;
-
Lee, Yun-Soo
(Advanced Display Manufacturing Research Center, Kyungpook National University)
;
-
Park, Lee-Soon
(Department of Polymer Science, Kyungpook National University)
- Published : 2008.10.13
Abstract
A negative photoresist formulation was developed utilizing synthesized UV monomers containing imide linkage, photoinitiator, UV oligomer, and alkali developable polymer matrix. It was found that via-holes with good resolution, high transmittance and thermal resistance could be obtained by photolithographic process utilizing the negative-type photoresist formulations.
File
Acknowledgement
Supported by : Ministry of Commerce, Industry and Energy