A Study of Measuring a sophisticated Photoresist dispense

PR(Photoresist) 분사량 측정에 관한 연구

  • Shin, Dong-Won (Samsung Semiconductor Institute of Technology(SSIT)) ;
  • Lee, Sung-Young (Samsung Semiconductor Institute of Technology(SSIT)) ;
  • Kim, Sang-Sik (FAB 5 Team, Memory Division Semiconductor Business) ;
  • Lee, Joong-Hyeon (FAB 5 Team, Memory Division Semiconductor Business) ;
  • Han, Min-Suk (FAB 5 Team, Memory Division Semiconductor Business)
  • 신동원 (삼성전자 공과대학교) ;
  • 이성영 (삼성전자 공과대학교) ;
  • 김상식 (MEMORY사업부 FAB5팀) ;
  • 이중현 (MEMORY사업부 FAB5팀) ;
  • 한민석 (MEMORY사업부 FAB5팀)
  • Published : 2008.06.18

Abstract

Reducing the PR(Photoresist) dispense Rate is one of the important issues in Photolithography. It is a main concern that variation in PR dispense rate and existance of microbubble. so we need to measure the photoresist dispense rate more precisely. This paper presented a noble sensor of measuring the PR dispense and detecting the microbubble.

Keywords